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Surface Treatment of ITO (Indium-Tin-Oxide) thin Films Prepared by Sol-Gel Process
Seung-Yong Jung, Young-Hoon Yun, Seog-Joo Yon
J. Korean Ceram. Soc. 2007;44(6):313
DOI: https://doi.org/10.4191/kcers.2007.44.6.313
      
Effects of Post-Annealing on Crystallization and Electrical Behaviors of ITO Thin Films Sputtered on PES Substrates
Byung-Soo So, Young-Hwan Kim
J. Korean Ceram. Soc. 2006;43(3):185
DOI: https://doi.org/10.4191/kcers.2006.43.3.185
      
Design and Fabrication of Multilayer Diplexer for Dual Band GSM/DCS Applications using Lumped Elements
심성훈, 강종윤, 최지원, 윤영중, 김현재, 윤석진
J. Korean Ceram. Soc. 2003;40(11):1090
DOI: https://doi.org/10.4191/kcers.2003.40.11.1090
      
Annealing Temperature Dependence on Anodizing Properties of ZrO2/Al Films Prepared by Sol-gel Method
박상식, 이병택
J. Korean Ceram. Soc. 2003;40(9):909
DOI: https://doi.org/10.4191/kcers.2003.40.9.909
      
Activated Carbons as Electrode Materials in Electric Double-Layer Capacitors I. Electrochemical Properties of Activated Carbons in Relation to their Porous Structures and Surface Oxygen Functional Groups
Chang-Hee Kim, Su-Il Pyun
J. Korean Ceram. Soc. 2003;40(9):819
DOI: https://doi.org/10.4191/kcers.2003.40.9.819
         Cited By 2
The Fabrication of ITO Thin-film O3 Gas Sensors Using R.F. Magnetron Sputtering Method and their Characterization
Jung-Bum Kwon, Kyoung-Keun Jung, Dong-Su Lee, Jo-Woong Ha, Kwang-Soo Yoo
J. Korean Ceram. Soc. 2002;39(9):840
DOI: https://doi.org/10.4191/kcers.2002.39.9.840
         Cited By 3
Study on Condition of Fabrication Processing for R. F. High-power Unit Capacitor and Electrical Characteristics According to Addition of ZrO2
Young-Soo Ahn, Joon-Soo Kim, Joo-Seok Park, Hong-Soo Kim, Moon-Hee Han, Kwang-Soo No
J. Korean Ceram. Soc. 2002;39(9):822
DOI: https://doi.org/10.4191/kcers.2002.39.9.822
      
Reflection Properties of SiO2/ITO Transparent and Conductive Thin Films for Display
Yong-Wook Shin, Sang-Woo Kim, Ki-Hyun Yoon
J. Korean Ceram. Soc. 2002;39(3):233
DOI: https://doi.org/10.4191/kcers.2002.39.3.233
      
Nonhomogeneity of the Electrical Properties with Deposition Position in an ITO Thin Film Deposited under a Given R.F. Magnetron Sputtering Condition
유동주, 최시경
J. Korean Ceram. Soc. 2001;38(11):973
      
Electrical Properties of ${Ba_{0.5}}{Sr_{0.5}}{TiO_3}$Thin Film with Various Heat Treatment Conditions
손영국
J. Korean Ceram. Soc. 2001;38(5):492
      
A Study on the Properties of Cement Mortar with Modified Oyster Shell Powder
이승헌, 김홍주, 정영채, 배선건
J. Korean Ceram. Soc. 2001;38(3):231
      
The Characterization of Electromagnetic Shielding of $SiO_2$/ITO Nano Films with Transition Metal Ions
신용욱, 김상우, 손용배, 윤기현
J. Korean Ceram. Soc. 2001;38(1):15
      
Relationship between Film Density and Electrical Properties on D.C. Magnetron Reactive Sputtered Sn-doped ${In_2}{O_3}$Films
이정일, 최시경
J. Korean Ceram. Soc. 2000;37(7):686
      
Temperature Dependence of Dielectric Properties of BaTiO$_3$ doped with Nb$_2$O$_5$ and CoO
최광휘, 황진현, 한영호
J. Korean Ceram. Soc. 1998;35(8):864
      
Electrode Dependence of Asymmetric Behavior of (La,Sr)CoO₃/Pb(Zr,Ti)O₃/(La,Sr)CoO₃ Thin Film Capacitors
최치홍, 이재찬, 박배호, 노태원
J. Korean Ceram. Soc. 1998;35(7):647
Preparation and Characterization of Transparent Conductive ITO Films by MOD Process
이병우
J. Korean Ceram. Soc. 1998;35(4):385
      
Sintering Behaviors of ITO Ceramics with Additions of TiO$_2$
정성경, 김봉철, 장세홍, 김정주
J. Korean Ceram. Soc. 1998;35(4):347
      
The Effects of La Doping on Characteristics of PLZT Thin Films for DRAM Capacitor Applications
김지영
J. Korean Ceram. Soc. 1997;34(10):1060
      
Characteristics of Oxynitride MOS Capacitor Prepared in $N_2O$ Atmosphere of Furnace
박진성, 문종하, 이은구
J. Korean Ceram. Soc. 1995;32(11):1241
      
Characterization of Electrical Properties of $Ba_{0.65}Sr_{0.35}TiO_3$Thin Films Deposited by RF Magnetron Sputtering
양기덕, 조호진, 조해석, 김형준
J. Korean Ceram. Soc. 1995;32(4):441
      
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